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The SEMATECH Berkeley MET: extending EUV learning to 16-nm half pitchANDERSON, Christopher N; MAE BACLEA-AN, Lorie; DENHAM, Paul E et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 79690R.1-79690R.6, 2Conference Paper

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